New method for high-accuracy determination of the fine-structure constant based on quantized Hall resistance

Physical Review Letters, vol.45, no.6, p. 494-7 (1980)

von Klitzing, K.; Dorda, G.; Pepper, M.

Measurements of the Hall voltage of a two-dimensional electron gas, realized with a silicon metal-oxide- semiconductor field-effect transistor, show that the Hall resistance at particular, experimentally well-defined surface carrier concentrations has fixed values which depend only on the fine-structure constant and speed of light and is insensitive to the geometry of the device. Preliminary data are reported.
 

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Original measurement on silicon MOSFET
which marks the beginning of QHE-research