Sputter gun arrangement
The sputter guns are mounted
on a dual source column on which two ion sources are installed. The dual
source column is designed to optimize the conditions for
ultra-shallow depth profiling
at very low sputtering energies, 200 eV to 2 keV. The sputter sources are
an electron impact gas source
for oxygen and the noble gases and a Cs source. Both sources are mounted
on the dual source column.
Oxygen has the effect of conditioning
the sample surface to enhance the ion yields of the electropositive
Al+, Cr+, ?). The availability of different gas ions
gives flexibility for a variety of applications.
A cesium source provides good
ion yields for the electronegative elements (N-, O-,